Electron beam lithography
The SEM-based electron beam lithography (EBL) system allows precise control of the scanning path and energy deposition of the electron beam to realize high-resolution patterning exposure. The system adopts advanced electron beam scanning control technology, which supports flexible and diverse pattern design and precise control. In addition to the electron beam exposure function, it also retains the original observation function of the SEM, which allows users to complete the observation and processing of samples on the same equipment, improving work efficiency and convenience.