Functions: The SEM-based electron beam lithography (EBL) system allows precise control of the scanning path and energy deposition of the electron beam to realize high-resolution patterning exposure. The system adopts advanced electron beam scanning control technology, which supports flexible and diverse pattern design and precise control. In addition to the electron beam exposure function, it also retains the original observation function of the SEM, which allows users to complete the observation and processing of samples on the same equipment, improving work efficiency and convenience.

Minimum beam spot better than 5nm; Probe current: 1pA~20nA; Line width better than 15nm

Application Scenarios: Scientific research and teaching; Microelectronics manufacturing; Prototype device development; Nanomaterials preparation; Biomedical research

The vacuum interconnected scanning electron microscope is used for automatic detection of the products transferred by the sample cart, analyze the surface grain morphology, size, distribution and other information, and evaluate the quality of the film.

The vacuum interconnection system allows the sample to be pre-processed under vacuum and transferred to the scanning electron microscope for observation.

The automatic detection and feedback system monitors and records sample labels, position status, and sample handover, observing the sample transfer status by CCD or glass window.

The ultrafast electron microscope uses external stimuli such as a laser or electric field to bring the sample to an excited state. Another laser beam with adjustable time delay is applied to the electron microscope filament to generate a pulsed electron beam that irradiates the sample surface, and then collects the secondary electrons escaping from the surface to characterize the excitation transient.